Applied Materials is sponsoring an interactive panel discussion celebrating 25 years of industry innovation in metrology, inspection, and process control at this year’s SPIE Advanced Lithography conference in San Jose, California.The event — a retrospective look at 25 years of technology developments — will gather speakers from top semiconductor manufacturers and lithography related industry, including ASML, Samsung and Mentor Graphics, in an informal exchange of opinions on what they view as key milestones in the evolution of lithography and what they foresee as major technology trends over the next few years.