Our blog is dedicated to a global discussion about the ideas, actions and technologies changing the world as we know it.
As global product manager in the Metal Deposition Group, Kavita manages a diverse portfolio of PVD, CVD and ALD products for copper interconnect metallization since joining the group in 2003. Prior to this position, she contributed as an ALD process engineer working on barrier and liner materials and later as a customer applications technologist leading strategic technical engagements with various logic and memory customers. In her more than 11 years with Applied Materials, Kavita has successfully enabled key business wins such as selective CVD metal capping and contributed to expanding the product application space. She holds a M. Eng. in chemical engineering from Cornell University.
Applied Materials introduces the biggest materials change in interconnect technology in 15 years with the announcement of the new Endura® Volta™ CVD system. Its unique cobalt processes ease critical interconnect scaling bottlenecks to enable continued momentum of Moore’s Law.