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Adam Ge
Adam Ge is an application engineer in the eBeam Inspection and Metrology division at Applied Materials. He has worked in Metrology for the past decade, most recently as product specialist for CD-SEM. He received his master’s degree in materials engineering from the Harbin Institute of Technology.
Patterning challenges for the semiconductor industry are growing as the number of multi-patterned layers being used in the 10nm and beyond nodes increase.
