HKMG

Introducing Breakthroughs in Materials Engineering for DRAM Scaling

To help the industry meet global demand for more affordable, high-performance memory, Applied Materials today introduced solutions that support three levers of DRAM scaling: a new hard mask material for capacitor scaling, a low-k dielectric material for the interconnect wiring, and the adoption of high-k metal gate transistors for advanced DRAM designs.
Fixing a Planar Problem

Fixing a Planar Problem

For the past several years, the industry has been transitioning to high k metal gate (HKMG) transistors in high-performance logic chips. It’s been a tough engineering challenge requiring extensive research into new materials and production processes. But today, HKMG transistors are successfully being produced in high volume manufacturing for advanced logic devices.