eBeam

Introducing Breakthroughs in Materials Engineering for DRAM Scaling

To help the industry meet global demand for more affordable, high-performance memory, Applied Materials today introduced solutions that support three levers of DRAM scaling: a new hard mask material for capacitor scaling, a low-k dielectric material for the interconnect wiring, and the adoption of high-k metal gate transistors for advanced DRAM designs.
eBeam Applications

eBeam Applications

eBeam technology is used in a variety of process control and monitoring applications to help optimize the quality and stability of device fabrication as discussed in the video and summarized in an infographic.