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Collaboration is Key to Enabling Advanced Patterning in the Angstrom Era
by Regina Freed | March 5, 2024
At the recent SPIE Advanced Lithography + Patterning Conference, Applied Materials hosted a panel titled, Patterning in the Angstrom Era: It Takes an Ecosystem, which delved deep into the changes coming to the patterning infrastructure across design, process and control. I was fortunate to be on the panel along with experts from NVIDIA, Intel, imec and Siemens EDA.
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