This video features Jim Kawski from Applied’s Varian Semiconductor Equipment business unit, who knows a thing or two about the subject. Jim discusses why we need ion implantation, what the process looks like at the atomic level and how an implanter actually works.

You can watch part two after the jump, where Jim goes on to explore how implant is used to make actual semiconductor devices.

Pure silicon isn’t terribly thrilling. It’s neither a perfect insulator nor a perfect conductor. It’s somewhere in the middle.

Inserting a smattering of boron or phosphorus atoms into the silicon crystal lattice really spices things up. This process is called ion implantation and it’s one of the fundamental processes used to make microchips.

Since we launched new ion implantation technology today, in the form of the Applied Varian VIISta® Trident high current system, it seems a good time to take a closer look at the fundamentals of ion implantation.

This video features Jim Kawski from Applied’s Varian Semiconductor Equipment business unit, who knows a thing or two about the subject. Jim discusses why we need ion implantation, what the process looks like at the atomic level and how an implanter actually works.

In part two, Jim goes on to explore how implant is used to make actual semiconductor devices.

This isn’t our last word on the subject, as the “101” title implies. Stay tuned…