SPIE

Lithography Celebrates 25 Years on the Cutting Edge

Lithography Celebrates 25 Years on the Cutting Edge

Applied Materials recently hosted a panel discussion with several distinguished semiconductor industry speakers as part of the SPIE Advanced Lithography conference earlier this month, which I had the honor of moderating. The panel discussion, a retrospective look at the 25 years of technology developments in metrology, inspection and process control was co-hosted by Chris Raymond, technology director at Nanometrics, Inc. and Chair of the SPIE Conference.