Process Control

Lithography Celebrates 25 Years on the Cutting Edge

Lithography Celebrates 25 Years on the Cutting Edge

Applied Materials recently hosted a panel discussion with several distinguished semiconductor industry speakers as part of the SPIE Advanced Lithography conference earlier this month, which I had the honor of moderating. The panel discussion, a retrospective look at the 25 years of technology developments in metrology, inspection and process control was co-hosted by Chris Raymond, technology director at Nanometrics, Inc. and Chair of the SPIE Conference.
25 Years of Industry Innovation in Metrology, Inspection & Process Control

25 Years of Industry Innovation in Metrology, Inspection & Process Control

Applied Materials is sponsoring an interactive panel discussion celebrating 25 years of industry innovation in metrology, inspection, and process control at this year’s SPIE Advanced Lithography conference in San Jose, California.The event — a retrospective look at 25 years of technology developments — will gather speakers from top semiconductor manufacturers and lithography related industry, including ASML, Samsung and Mentor Graphics, in an informal exchange of opinions on what they view as key milestones in the evolution of lithography and what they foresee as major technology trends over the next few years.
LED Automation Software: Understanding the Process Through Data is an Important First Step

LED Automation Software: Understanding the Process Through Data is an Important First Step

Previously, I wrote about how LED manufacturers were striving to shorten the time between initiating the LED manufacturing process and measuring their performance in an effort to improve the product yields and possibly even boost LED performance.Certainly one of the keys to making this possible is having rapid access to manufacturing data. There are many ways to gather data for analysis by the process engineers.