photomask

Applied Explains: Photomask Technology for the EUV Era

Applied Explains: Photomask Technology for the EUV Era

Photomasks, as regular readers of this blog may recall, are the blueprints used for making chips. The photolithography process prints the patterns etched on the mask onto silicon wafers to define transistors, memory cells and wiring – all the nanoscale structures that make up a functional device.Lithography is expected to undergo a seismic shift over the next few years as the industry adopts a new technology called extreme ultraviolet lithography, or EUV for short. This change requires a new generation of photomasks featuring new materials and operating principles.
Applied Materials

Photomasks - Seeking Projection Perfection

Photomasks, the quartz plates that hold microchip circuit patterns, must be as close to perfect as possible. Any imperfections will be reproduced on every chip on every wafer, potentially wasting a lot of time and expensive silicon.Applied is a vital part of the mask making ecosystem. Virtually every high-end mask is made using Applied’s Tetra etch systems, a new version of which has just been released.