metrology

Lithography Celebrates 25 Years on the Cutting Edge

Lithography Celebrates 25 Years on the Cutting Edge

Applied Materials recently hosted a panel discussion with several distinguished semiconductor industry speakers as part of the SPIE Advanced Lithography conference earlier this month, which I had the honor of moderating. The panel discussion, a retrospective look at the 25 years of technology developments in metrology, inspection and process control was co-hosted by Chris Raymond, technology director at Nanometrics, Inc. and Chair of the SPIE Conference.
25 Years of Industry Innovation in Metrology, Inspection & Process Control

25 Years of Industry Innovation in Metrology, Inspection & Process Control

Applied Materials is sponsoring an interactive panel discussion celebrating 25 years of industry innovation in metrology, inspection, and process control at this year’s SPIE Advanced Lithography conference in San Jose, California.The event — a retrospective look at 25 years of technology developments — will gather speakers from top semiconductor manufacturers and lithography related industry, including ASML, Samsung and Mentor Graphics, in an informal exchange of opinions on what they view as key milestones in the evolution of lithography and what they foresee as major technology trends over the next few years.
Applied’s Technologists in Photovoltaics World Magazine

Applied’s Technologists in Photovoltaics World Magazine

Applied Materials’ Ken MacWilliams, Jen Shu, Andrea Moretto and Farhan Ahmad contributed to an article in the latest issue of Photovoltaics World magazine, where they focus on lower cost crystalline silicon solar panels and their potential to help us reach grid parity -- where the cost to generate power on rooftops meets the cost to purchase power from the grid.  Below is an excerpt from the article: