inspection

Applied Ventures Expands Portfolio with Two New Investments

Applied Ventures Expands Portfolio with Two New Investments

With 2013 in our rear-view mirror, I’m pleased to announce that Applied Ventures has completed another successful and busy year, investing more than $18 million in 2013, including closing six new investments in early stage companies.  Altogether, since we first formed Applied Ventures in 2005, we have invested approximately $179 million in more than 50 portfolio companies spanning equipment, materials, device and process providers in the clean energy, semiconductor, display, lighting and energy storage sectors. 
Lithography Celebrates 25 Years on the Cutting Edge

Lithography Celebrates 25 Years on the Cutting Edge

Applied Materials recently hosted a panel discussion with several distinguished semiconductor industry speakers as part of the SPIE Advanced Lithography conference earlier this month, which I had the honor of moderating. The panel discussion, a retrospective look at the 25 years of technology developments in metrology, inspection and process control was co-hosted by Chris Raymond, technology director at Nanometrics, Inc. and Chair of the SPIE Conference.
DUV Laser Critical for Next Generation Inspection

DUV Laser Critical for Next Generation Inspection

As integrated circuit (IC) manufactures continue to pursue Moore’s Law, smaller and smaller features are printed on chips. That’s an easy statement to make, but in practice it is very difficult and complicated to do, especially when there are tiny defects that are practically invisible. A defect can be a small particle, a scratch or a bump on the surface of a wafer, a void in the material or a bridge between two lines. Some are big — although big in our world means just a few millionths of a meter — and some are very small.
25 Years of Industry Innovation in Metrology, Inspection & Process Control

25 Years of Industry Innovation in Metrology, Inspection & Process Control

Applied Materials is sponsoring an interactive panel discussion celebrating 25 years of industry innovation in metrology, inspection, and process control at this year’s SPIE Advanced Lithography conference in San Jose, California.The event — a retrospective look at 25 years of technology developments — will gather speakers from top semiconductor manufacturers and lithography related industry, including ASML, Samsung and Mentor Graphics, in an informal exchange of opinions on what they view as key milestones in the evolution of lithography and what they foresee as major technology trends over the next few years.