25 Years of Industry Innovation in Metrology, Inspection & Process Control

Applied Materials is sponsoring an interactive panel discussion celebrating 25 years of industry innovation in metrology, inspection, and process control at this year’s SPIE Advanced Lithography conference in San Jose, California.

The event — a retrospective look at 25 years of technology developments — will gather speakers from top semiconductor manufacturers and lithography related industry, including ASML, Samsung and Mentor Graphics, in an informal exchange of opinions on what they view as key milestones in the evolution of lithography and what they foresee as major technology trends over the next few years. The fun, fast-paced session will incorporate an interactive response system to track audience perspectives on trends, stimulate the exchange of views, and challenge their knowledge of lithography history in a competitive format.

This panel discussion is on Tuesday, March 1 at 4:30 p.m., as part of the SPIE Conference (February 27 – March 3) which plays a key role in bringing the lithography community together to solve challenges required by the semiconductor industry to fabricate next-generation integrated circuits.

For more information about this event visit our web site.

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